Dynamics and control of the Czochralski process II. Objectives and control structure design
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference42 articles.
1. An electronic device including a TV-system for controlling the crystal diameter during czochralski growth
2. Automatic crystal pulling with optical diameter control using a laser beam
3. The basis of automatic diameter control utilizing “bright ring” meniscus reflections
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1. Physically-based, lumped-parameter models for the prediction of oxygen concentration during Czochralski growth of silicon crystals;Journal of Crystal Growth;2021-12
2. Model-Free Adaptive Iterative Learning Control Method for the Czochralski Silicon Monocrystalline Batch Process;IEEE Transactions on Semiconductor Manufacturing;2021-08
3. Inverse response behaviour in the bright ring radius measurement of the Czochralski process I: Investigation;Journal of Crystal Growth;2021-08
4. Numerical Modeling and Control of the Dynamic Single Silicon Crystal Growth Process;IEEE Transactions on Semiconductor Manufacturing;2021-02
5. Limitations on control performance in the Czochralski crystal growth process using bright ring measurement as a controlled variable;IFAC-PapersOnLine;2019
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