Chemical vapour deposition of rutile films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference30 articles.
1. preparation, properties and optical applications of thin films of titanium dioxide
2. Titanium-dioxide dielectric films prepared by vapor reaction
3. Oxide Films Formed on Titanium, Zirconium, and Their Alloys with Nickel, Copper, and Cobalt
4. Optical properties of thin films
5. Sputtered Titanium Oxide Films for Microcircuit Applications
Cited by 37 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Chemical vapor deposition of TiO2 thin films from a new halogen-free precursor;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-11
2. Synthesis of rutile films activated by photon treatment;Inorganic Materials: Applied Research;2012-05
3. Investigation of New 2,5-Dimethylpyrrolyl Titanium Alkylamide and Alkoxide Complexes as Precursors for the Liquid Injection MOCVD of TiO2;Chemical Vapor Deposition;2010-03
4. TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O;Applied Surface Science;2004-03
5. RF-assisted pulsed laser deposition of oxides;SPIE Proceedings;2002-08-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3