ASEP: a CAD program for silicon anisotropic etching

Author:

Buser Rudolf A.,de Rooij Nicolaas F.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. OYSTER;Koppelman;IEEE MEMS Workshop Salt Lake City, UT, U.S.A.,1989

2. SENSIM: a simulation program for solid-state pressure sensors;Lee;IEEE Trans. Electron Devices,1982

3. Measurement of anisotropic etching rate of single crystal silicon to the comple orientation;Sato;JIEE Tech. Meet. Micromachining and Micromechatronics, Japan,1989

4. Microfabrication on the Macintosh;Séquin;Proc. USENIX Computer Graphics Workshop Monterey, CA, U.S.A.,1989

5. ANSYS is a well-known FEM program distributed by Swanson Analysis Systems, Inc. Houston, TX, U.S.A.

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4. Step flow model in continuous cellular automata method for simulation of anisotropic etching of silicon;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-04-26

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