Wafer bonding: Investigation and in situ observation of the bond process

Author:

Harendt Christine,Graf Heinz-Gerd,Penteker Elisabeth,Höfflinger Bernd

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Wafer bonding for silicon-on-insulator technologies;Lasky;Appl. Phys. Lett.,1986

2. Bonding of silicon wafers for silicon-on-insulator;Mamszara;J. Appl. Phys.,1988

3. A. Nakagawa, K. Watanabe, Y. Yamaguchi, H. Ohashi and K. Furukawa, 1800 V bipolar-mode MOSFETS: a first application of silicon wafer direct bonding (SDB) technique to a power device, Proc. IEDM 86, pp. 122–125.

4. Bubble-free silicon wafer bonding in a non-cleanroom enviromunt;Stengl;Jpn. J. Appl. Phys.,1988

5. R. Stengl, T. Tan and U. Gösele, A model for the silicon wafer bonding process, Jpn. J. Appl. Phys., to be published.

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1. Wafer Bonding;Reference Module in Materials Science and Materials Engineering;2016

2. Wafer-level assembly and sealing of a MEMS nanoreactor forin situmicroscopy;Journal of Micromechanics and Microengineering;2010-07-22

3. Wafer Bonding;Comprehensive Microsystems;2008

4. Wafer Bonding Techniques for MEMS;Sensor Letters;2005-12-01

5. Adhesion quantification methods for wafer bonding;Materials Science and Engineering: R: Reports;2005-12

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