Prop-2-en-1-one Derivatives as Corrosion Inhibitors for Copper in 1 M HNO3-Reference-Cited by-同舟云学术

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Prop-2-en-1-one Derivatives as Corrosion Inhibitors for Copper in 1 M HNO3

Published:2014-04 Issue:4 Volume:9 Page:1867-1891
ISSN:1452-3981
Container-title:International Journal of Electrochemical Science
language:en
Short-container-title:International Journal of Electrochemical Science

Author:

Fouda A.S.,Eldesoky A.M.,El-Sonbati A.Z.,Salam S.F.

Publisher

Elsevier BV

Subject

Electrochemistry

Reference57 articles.

1. Characterization of Sputtered Tantalum Carbide Barrier Layer for Copper Metallization

2. Self-assembled near-zero-thickness molecular layers as diffusion barriers for Cu metallization

3. Interactions between solder and metallization during long-term aging of advanced microelectronic packages

4. Correlation of Surface Wettability and Corrosion Rate for Benzotriazole‐Treated Copper

5. C. Fiaud, Proceedings of the Int. Symposium on Control of Copper and Copper Alloys Oxidation, Rouen, France, (1992).97.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Copper Corrosion Inhibitors. Period 2008-2014. A Review;International Journal of Electrochemical Science;2015-02

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