Interfacial reaction induced digital-to-analog resistive switching in TiO2-based memory devices

Author:

Hu LifangORCID,Gao Wei,Xiao Ming,Li Zihao

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference49 articles.

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3. A composite thin film of simultaneously formed carbon and SnO2 QDs for supercapacitor application;Gaikwad;New J. Chem.,2018

4. Photocatalytic degradation of bisphenol A in the presence of C-doped ZnO: effect of operational parameters and photodegradation mechanism;Bechambi;J. Ind. Eng. Chem.,2015

5. 1T1R nonvolatile memory with Al/TiO₂/Au and sol-gel-processed insulator for barium Zirconate nickelate gate in pentacene thin film transistor;Lee;Materials,2017

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