Study of nitrogen-rich silicon oxynitride films obtained by PECVD
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference12 articles.
1. Plasma enhanced chemical vapor deposition silicon oxynitride optimized for application in integrated optics
2. Plasma enhanced CVD silicon oxide films for integrated optic applications
3. Optimization of plasma-deposited silicon oxinitride films for optical channel waveguides
4. Investigation on optical and microstructural properties of photoluminescent LPCVD SiOxNy thin films
5. Modification of refractive index in silicon oxynitride films during deposition
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1. Infrared study of the structure of silicon oxynitride films produced by plasma enhanced chemical vapor deposition;Journal of Non-Crystalline Solids;2023-10
2. Broad and nearly white photoluminescence induced by the nitrogen incorporation in Si/SiOxNy multilayers;Journal of Luminescence;2021-11
3. N-type polysilicon passivating contacts using ultra-thin PECVD silicon oxynitrides as the interfacial layer;Solar Energy Materials and Solar Cells;2021-10
4. Pedestal waveguides based on GeO2-Bi2O3, GeO2-PbO, Ta2O5 and SiOxNy cores as platforms for optical amplifiers and nonlinear optics applications: Review of recent advances;Journal of Luminescence;2021-08
5. Low-Temperature and Low-Pressure Silicon Nitride Deposition by ECR-PECVD for Optical Waveguides;Applied Sciences;2021-02-27
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