Multi-dipolar plasmas for plasma-based ion implantation and plasma-based ion implantation and deposition-Reference-Cited by-同舟云学术

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Multi-dipolar plasmas for plasma-based ion implantation and plasma-based ion implantation and deposition

Published:2004-08 Issue:1-2 Volume:186 Page:170-176
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Béchu S.,Maulat O.,Arnal Y.,Vempaire D.,Lacoste A.,Pelletier J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference30 articles.

1. Sheath dynamics in plasma immersion ion implantation

2. Inherent possibilities and restrictions of plasma immersion ion implantation systems

3. Ion implantation by plasma immersion: interest, limitations and perspectives

4. New trends in PBII technology: industrial perspectives and limitations

5. New trends in DECR plasma technology: applications to novel duplex treatments and process combinations with extreme plasma specifications

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