Use of low energy and high frequency PBII during thin film deposition to achieve relief of intrinsic stress and microstructural changes
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference22 articles.
1. Handbook of Plasma Immersion Ion Implantation and Deposition,2000
2. Energetic deposition using filtered cathodic arc plasmas
3. Control of stress and microstructure in cathodic arc deposited films
4. Effect of intrinsic stress on preferred orientation in AlN thin films
5. Minimisation of intrinsic stress in titanium nitride using a cathodic arc with plasma immersion ion implantation
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