Thermal decomposition of Zr1−xAlxN thin films deposited by magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference19 articles.
1. On structure and properties of sputtered Ti and Al based hard compound films
2. Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphere
3. Oxidation of metastable single‐phase polycrystalline Ti0.5Al0.5N films: Kinetics and mechanisms
4. Superhard nanocomposite Ti1−xAlxN films prepared by magnetron sputtering
5. Effects of Al content on hardness, lattice parameter and microstructure of Ti1−xAlxN films
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3. Influence of the nitrogen content in the gas mixture on elemental composition of Zr1−xAlxN thin coating, its microhardness and friction coefficient;Materials Today: Proceedings;2019
4. Self-structuring in Zr1−xAlxN films as a function of composition and growth temperature;Scientific Reports;2018-11-05
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