The effect of pulse sequence modulation and pulse energy on structural coating properties and coating composition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference18 articles.
1. Pulsed magnetron sputter technology
2. Physical vapor deposition tool coatings
3. Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering
4. The deposition of hard crystalline Al2O3 layers by means of bipolar pulsed magnetron sputtering
5. Dual magnetron sputtering (DMS) system with sine-wave power supply for large-area coating
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1. Comparison of CrAlN layers obtained with one (CrAl) or two targets (Cr and Al) by magnetron sputtering;Thin Solid Films;2012-01
2. A comparative study of CrAlN films synthesized by dc and pulsed dc reactive magnetron facing target sputtering system with different pulse frequencies;Journal of Alloys and Compounds;2010-10
3. Entwicklung neuer PVD-Beschichtungen;Umweltverträgliche Tribosysteme;2010
4. Effect of asynchronous pulsing parameters on the structure and properties of CrAlN films deposited by pulsed closed field unbalanced magnetron sputtering (P-CFUBMS);Surface and Coatings Technology;2008-01
5. Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content;MATERIALS TRANSACTIONS;2008
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