Notable difference between rapid-thermal and microwave annealing on Ge pMOSFETs-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Notable difference between rapid-thermal and microwave annealing on Ge pMOSFETs

Published:2021-09 Issue: Volume:421 Page:127465
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Ruan Dun-Bao,Chang-Liao Kuei-Shu,Yi Shih-Han,Chu Fu-Yang,Li Ji-Syuan,Hsu Chia-Wei,Huang Jiayi,Wu Tzung-Yu

Funder

Ministry of Science and Technology, Taiwan

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference32 articles.

1. Material potential and scalability challenges of germanium CMOS;Toriumi,2011

2. Experimental study on hole and electron effective masses in inversion layers of Ge (100), (110) and (111) p- and n-MOSFETs;Zhang,2016

3. Effects of fluorine based double plasma treatment on electrical and reliability characteristics of Ge pMOSFETs;Ruan;Microelectron. Eng.,2019

4. Radiation effects and reliability characteristics of Ge pMOSFETs;Ruan;Microelectron. Eng.,2019

5. Enhanced zirconia oxide dielectric quality of germanium p-channel metal oxide semiconductor field effect transistor by in-situ low temperature treatment in atomic layer deposition process;Ruan;Thin Solid Films,2020

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The physical parameters of MOS structures in the presence of local mechanical stress;Measurement;2024-08

2. Performance Improvement for Ge FinFET CMOS Inverter With Supercritical Fluid Treatment;IEEE Electron Device Letters;2022-06

3. Enhanced reliability and uniformity for Ge pMOSFET with low temperature supercritical fluid treatment;Surface and Coatings Technology;2021-10

4. Effects of pre- and post-microwave annealing treatments on pGe MOS device;Surface and Coatings Technology;2021-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3