Deposition of a low-stress diamond film on stainless steel with a Mo/Mo-N interlayer-Reference-Cited by-同舟云学术

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Deposition of a low-stress diamond film on stainless steel with a Mo/Mo-N interlayer

Published:2024-10 Issue: Volume:493 Page:131290
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Li Xiao,Zhang Xijin,Xia Fan,Chen Chengke,Jiang Meiyan,Lu Shaohua,Hu Xiaojun

Funder

Key Research and Development Program of Jiangxi Province

Natural Science Foundation of Zhejiang Province

Zhejiang Province Science and Technology Department

NSFC

Publisher

Elsevier BV

Reference32 articles.

1. CVD diamond films: from growth to applications;Gicquel;Curr. Appl. Phys.,2001

2. The oxidization behavior and mechanical properties of ultrananocrystalline diamond films at high temperature annealing;Huang;Appl. Surf. Sci.,2014

3. Emerging applications of nanodiamonds in photocatalysis;Li;Funct. Diamond,2021

4. Growth of diamond films on stainless steel;Chen;Thin Solid Films,1992

5. A novel Mo-W interlayer approach for CVD diamond deposition on steel;Kundrát;AIP Adv.,2015

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