Structural and mechanical properties of amorphous silicon carbonitride films prepared by vapor-transport chemical vapor deposition-Reference-Cited by-同舟云学术

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Structural and mechanical properties of amorphous silicon carbonitride films prepared by vapor-transport chemical vapor deposition

Published:2009-11 Issue:4 Volume:204 Page:539-545
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Awad Y.,El Khakani M.A.,Aktik C.,Mouine J.,Camiré N.,Lessard M.,Scarlete M.,Al-Abadleh H.A.,Smirani R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference55 articles.

1. Optical constants of amorphous hydrogenated carbon and silicon-carbon alloy films and their application in high temperature solar selective surfaces

2. a‐SiC:H/a‐Si:H heterojunction solar cell having more than 7.1% conversion efficiency

3. Differences in physical properties of hydrogenated and fluorinated amorphous silicon carbide prepared by reactive sputtering

4. Plasma deposition of amorphous SiC:H,F alloys from SiF4‐CH4‐H2mixtures under modulated conditions

5. Bonding configurations and optical band gap for nitrogenated amorphous silicon carbide films prepared by pulsed laser ablation

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