Author:
Audronis M.,Bellido-Gonzalez V.,Daniel B.
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference26 articles.
1. Ionized physical vapor deposition (IPVD): A review of technology and applications
2. Journal of Vacuum Science and Technology A;Christou;Vac. Surf. Films,2000
3. Directional and preferential sputtering-based physical vapor deposition
4. J. Weichart, S. Kadlec, M. Elghazzali, USA Patent No. U.S. Patent application No. 2009173622 (A1), 2009.
5. J. Madeira, A. Ehiasarian, P. Hovsepian, K. Marchev, N. Sonnenberg, Patent No. WO/2009/013667, 2009.
Cited by
51 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献