Development of dark Ti(C,O,N) coatings prepared by reactive sputtering-Reference-Cited by-同舟云学术

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Development of dark Ti(C,O,N) coatings prepared by reactive sputtering

Published:2008-12 Issue:5-7 Volume:203 Page:804-807
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Chappé J.M.,Vaz F.,Cunha L.,Moura C.,Marco de Lucas M.C.,Imhoff L.,Bourgeois S.,Pierson J.F.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference16 articles.

1. Influence of deposition pressure on the structural mechanical and decorative properties of TiN thin films deposited by cathodic arc evaporation

2. Characterization of electrochemically deposited Cu–Ni black coatings

3. The physical and electrochemical properties of electroless deposited nickel–phosphorus black coatings

4. Bio-compatible low reflective coatings for surgical tools using reactive d.c.-magnetron sputtering and arc evaporation — a comparison regarding steam sterilization resistance and nickel diffusion

5. Graded layer design for stress-reduced and strongly adherent superhard amorphous carbon films

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3. Applications in decorative films;Modern Ion Plating Technology;2023

4. Nanostructured Black Nickel Coating as Replacement for Black Cr(VI) Finish;Applied Sciences;2021-04-26

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