Molecular design of improved precursors for the MOCVD of oxides used in microelectronics-Reference-Cited by-同舟云学术

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Molecular design of improved precursors for the MOCVD of oxides used in microelectronics

Published:2007-09 Issue:22-23 Volume:201 Page:9046-9054
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Jones Anthony C.,Aspinall Helen C.,Chalker Paul R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference94 articles.

1. Chemical Vapor Deposition of Electroceramic Thin Films

2. Epitaxial PbTiO3thin films grown by organometallic chemical vapor deposition

3. Molecular design of improved precursors for the MOCVD of electroceramic oxides

4. Liquid Delivery of Low Vapor Pressure MOCVD Precursors

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