Influence of unipolar pulse time offset between Ti and Zr dual cathodes in closed magnetic field high power impulse magnetron sputtering-Reference-Cited by-同舟云学术

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Influence of unipolar pulse time offset between Ti and Zr dual cathodes in closed magnetic field high power impulse magnetron sputtering

Published:2022-09 Issue: Volume:446 Page:128791
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Chang Jing-Tang,Kuo Chin-Chiuan

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference27 articles.

1. 4- sputter processing;Simon,2012

2. Chapter 3 - Magnetron discharges for thin films plasma processing;Musil,2006

3. A novel pulsed magnetron sputter technique utilizing very high target power densities;Kouznetsov;Surf. Coat. Technol.,1999

4. The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge;Bohlmark;Thin Solid Films,2006

5. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges And Applications,2020

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of pulse time offset between Cr and Zr dual cathodes in closed-magnetic-field unipolar high-power impulse magnetron sputtering;Surface and Coatings Technology;2024-08

2. Deposition of Ti Zr alloy films using Ti and Zr dual-cathode high-power impulse magnetron co-sputtering;Surface and Coatings Technology;2024-01

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