Non-reactive HiPIMS deposition of NbCx thin films: Effect of the target power density on structure-mechanical properties-Reference-Cited by-同舟云学术

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Non-reactive HiPIMS deposition of NbCx thin films: Effect of the target power density on structure-mechanical properties

Published:2022-08 Issue: Volume:444 Page:128674
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Bahr A.,Glechner T.,Wojcik T.,Kirnbauer A.,Sauer M.,Foelske A.,Hunold O.,Ramm J.,Kolozsvári S.,Ntemou E.,Pitthan E.,Primetzhofer D.,Riedl H.,Hahn R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference71 articles.

1. Handbook of Refractory Carbides and Nitrides;Pierson,1996

2. Electrical properties of hard materials;Williams;Int. J. Refract. Met. Hard Mater.,1999

3. Growth of ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions;Samuelsson;Surf. Coat. Technol.,2012

4. Non-reactively sputtered ultra-high temperature hf-C and ta-C coatings;Lasfargues;Surf. Coat. Technol.,2017

5. Structural, mechanical and tribological properties of ZrC thin films deposited by magnetron sputtering;Gilewicz;Vacuum,2019

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural and mechanical properties of magnetron sputtered (NbxMo1-x)C thin films;Vacuum;2024-06

2. NbC thin films via reactive DC sputtering in a CH4/Ar atmosphere;Surface and Coatings Technology;2024-04

3. Effect of Nb incorporation in Mo2BC coatings on structural and mechanical properties — Ab initio modelling and experiment;Acta Materialia;2024-04

4. Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target;Journal of Vacuum Science & Technology A;2023-10-27

5. Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering;Journal of Vacuum Science & Technology A;2023-10-09

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