Influence of Si content on Nano-structured Ti–Si–N films coated by pulsed-d.c. plasma enhanced CVD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference14 articles.
1. Plasma CVD: process capabilities and economic aspects
2. Hard coatings produced by PACVD applied to aluminium die casting
3. TiAlN and TiAlCN deposition in an industrial PaCVD-plant
4. Wear of Ti-Si-N coated ceramic cutting inserts
5. Investigations on cubic Ti(B,N) films prepared by reactive diode R.F. sputtering from a TiB2 target
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2. Improving wear and corrosion resistance of AISI 304 stainless steel by a multilayered nanocomposite Ti/TiN/TiSiN coating;Surfaces and Interfaces;2020-03
3. Ternary and quarternary TiBN and TiBCN nanocomposite coatings deposited by arc ion plating;Surface and Coatings Technology;2019-02
4. The effects of phase transformation on the structure and mechanical properties of TiSiCN nanocomposite coatings deposited by PECVD method;Applied Surface Science;2018-06
5. Influence of Si content on the wettability and corrosion resistance of nanocomposite TiSiN films deposited by pulsed-DC PACVD;Journal of Alloys and Compounds;2018-03
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