New hybrid source of cold atmospheric plasma-Reference-Cited by-同舟云学术

New hybrid source of cold atmospheric plasma

Published:2004-01 Issue: Volume:177-178 Page:688-692
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Baránková H.,Bárdoš L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference19 articles.

1. L. Bárdoš, H. Baránková, Swedish Patent No. 9904295-4, National filing in EU, USA and Japan, October 11, 1999, PCT/SE00/02315

2. Elektronentemperatur und Elektronenrauschen in der hochfrequenten Fackelentladung

3. Etching materials with an atmospheric-pressure plasma jet

4. Etching polyimide with a nonequilibrium atmospheric-pressure plasma jet

5. H. Sung-Spitzl, R. Spitzl, The Electrochemical Society Spring Meeting, International Symposium on Cold Atmospheric Plasma Technologies, Washington DC, March 25–29, 2001, Abstract no. 198

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