Microstrip gas chambers on implanted substrates-Reference-Cited by-同舟云学术

Microstrip gas chambers on implanted substrates

Published:1995-12 Issue:1-3 Volume:367 Page:185-188
ISSN:0168-9002
Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Pallarès A,Barthe S,Bergtold A.M,Brom J.M,Cailleret J,Christophel E,Coffin J,Eberlé H,Fang R,Fontaine J.C,Geist W,Kachelhoffer T,Levy J.M,Mack V,Schunck J.P,Sigward M.H

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference12 articles.

1. Evolution of the Automatic Spark Chambers

2. Some developments in the operation of multiwire proportional chambers

3. Performance of gas microstrip chambers on glass with ionic and electronic conductivity

4. Performance of gas microstrip chambers on glass substrata with electronic conductivity

5. Use of ultra thin semiconductive layers as passivation in microstrip gas chambers

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