Beitrag zur Phasenausbildung in dünnen Schichten des Systems CrSiO

Author:

Sobe G,Bauer H.D,Henke J,Heinrich A,Schreiber H,Grötzschel R

Publisher

Elsevier BV

Subject

General Engineering

Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Metal–insulator transition in amorphous alloys;Current Opinion in Solid State and Materials Science;1999-06

2. Nanoscale in-depth modification of CrOSi layers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-02

3. He+ and Ar+ bombardment induced chemical changes in CrOSi layers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-08

4. Mechanical stress and electrical resistance of CrSi-O thin films;Thin Solid Films;1995-06

5. High temperature X-ray diffraction studies of the crystallization process of thin amorphous films with the chemical composition CrSi2.57;Fresenius' Journal of Analytical Chemistry;1994

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