An Ultrastructural Study of Corneal Incisions Induced by an Excimer Laser at 193 nm
Author:
Publisher
Elsevier BV
Subject
Ophthalmology
Reference20 articles.
1. Self-developing photoetching of poly (ethylene terephthalate) films by far-ultraviolet excimer laser radiation;Srinivasan;Appl Phys Lett,1982
2. Self-developing UV photoresist using excimer laser exposure;Deutsch;J Appl Phys,1983
3. Direct high-resolution excimer laser photoetching;Rice;Appl Phys A,1984
4. Ablative photodecomposition: action of farultraviolet (193 nm) laser radiation on poly (ethylene terephthalate) films;Srinivasan;J Am Chem Soc,1982
5. Kinetics of the ablative photodecomposition of organic polymers in the far ultraviolet (193 nm);Srinivasan;J Vac Sci Technol B,1983
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