Influence of oxidation temperature on the microstructure and electrical properties of Ta2O5 on Si
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference35 articles.
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3. Thin Ta2O5 films prepared by low pressure metal organic CVD;Raush;Microelectron. J.,1993
4. Effect of deposition temperature on dielectric properties of PECVD Ta2O5 thin films;Moon;J. Mater. Sci.,1994
5. Microstructure and electrical properties of tantalum oxide thin film prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition;Kim;Jpn J. Appl. Phys.,1996
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