Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturing-Reference-Cited by-同舟云学术

Constraint feedforward control for thermal processing of quartz photomasks in microelectronics manufacturing

Published:2004-02 Issue:1 Volume:14 Page:31-39
ISSN:0959-1524
Container-title:Journal of Process Control
language:en
Short-container-title:Journal of Process Control

Author:

Tay Arthur,Ho Weng Khuen,Schaper Charles D.,Lee Lay Lay

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Modelling and Simulation,Control and Systems Engineering

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3. A heater plate assisted bake/chill system for photoresist processing in photolithography;Applied Thermal Engineering;2009-04

4. Optimal Feed-Forward Control for Multizone Baking in Microlithography;Industrial & Engineering Chemistry Research;2007-04-27

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