Silicide formation study at the interface of Zr/Si system using high-energy swift heavy ion
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Radiation
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1. The surface morphology evolution of ZrSi2 films under different substrate temperature;Materials Research Express;2019-11-08
2. FORMATION OF PLATINUM SILICIDE DURING RAPID THERMAL PROCESSING OF THE PLATINUM- SILICON SYSTEM: MICROSTRUCTURE AND ELECTROPHYSICAL CHARACTERISTICS;High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes;2019
3. Surface and interface modification of Zr/SiC interface by swift heavy ion irradiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-07
4. Formation of zirconium silicide between silicon substrate and zirconium films;Materials Letters;2014-05
5. Ion beam induced surface and interface engineering;Surface Science Reports;2011-03
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