Effects of plasma treatment on the properties of room-temperature liquid-phase deposited (LPD) oxide films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
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1. A New Process for Silica Coating
2. Novel technique for SiO/sub 2/ formed by liquid-phase deposition for low-temperature processed polysilicon TFT
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1. Performance and characteristics of imprint mould fabricated by liquid-phase deposition;Superlattices and Microstructures;2008-10
2. Review: Deposition of ceramic thin films at low temperatures from aqueous solutions;Journal of Electroceramics;2001
3. Effect of Surface Treatments on the Electrical Properties of Fluorinated Silicon Oxides;Journal of The Electrochemical Society;2000
4. CO2Laser Annealing on Fluorinated Silicon Oxide Films;Japanese Journal of Applied Physics;1999-09-15
5. Effects of O2- and N2O-Plasma Treatments on Properties of Plasma-Enhanced-Chemical-Vapor-Deposition Tetraethylorthosilicate Oxide;Japanese Journal of Applied Physics;1999-07-15
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