Author:
Small M.B.,Smith D.A.,Garratt-Reed A.J.
Reference13 articles.
1. Reduction of Electromigration in Aluminum Films by Copper Doping
2. F.M. d.'.Heurle and P.S. Ho in Thin Films; Interdiffusion and Reactions, Ed. J.M. Poate and K.N. Tu (Wiley, New York) pg. 243
3. Inhibition of Electromigration Damage in Thin Films
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