Quasicrystalline (Al,Pd)-phase in dilute AlSiVPd films for use as reliable metallizations in ultralarge scale integration
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference30 articles.
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Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. AlSiV and AlSiVPd films as alternatives for AlSiCu interconnect: microstructure and its impact on reliability;Thin Solid Films;1994-06
2. Reliability and microstructure of Al‐Si‐V‐Pd alloy films for use in ultralarge scale integration;Applied Physics Letters;1994-02-07
3. Impact of Microstructure of Alternative Al-Si-V-Pd Alloy Films on Interconnect Reliability, Compared to Al-Si-Cu;MRS Proceedings;1994
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