A systematic study of chemical vapor deposition growth of InN-Reference-Cited by-同舟云学术

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A systematic study of chemical vapor deposition growth of InN

Published:2008-12 Issue:5 Volume:255 Page:2153-2158
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cai X.M.,Ye F.,Jing S.Y.,Zhang D.P.,Fan P.,Xie E.Q.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference33 articles.

1. Nanowire electronic and optoelectronic devices

2. One-dimensional nanostructures: Chemistry, physics & applications

3. One-Dimensional Nanostructures: Synthesis, Characterization, and Applications

4. SEMICONDUCTOR NANOWIRES AND NANOTUBES

5. Growth and morphology of 0.80eV photoemitting indium nitride nanowires

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1. Effect of deposition time on nanocolumnar TiZrN films grown by reactive magnetron Co-sputtering with the OAD technique;Materiali in tehnologije;2021-02-12

2. Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers;Current Applied Physics;2019-08

3. Metallic indium segregation control of InN thin films grown on Si(1 0 0) by plasma-enhanced atomic layer deposition;Results in Physics;2019-03

4. Structure and photoluminescence properties of InN films grown on porous silicon by MOCVD;Optoelectronics Letters;2017-05

5. Development of low temperature technology for the growth of wide band gap semiconductor nanowires;AIMS Materials Science;2016

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