Investigation of the annealing temperature for few-layer MoS2 and ion-beam induced athermal annealing/purification behaviour by in-situ XRD-Reference-Cited by-同舟云学术

Investigation of the annealing temperature for few-layer MoS2 and ion-beam induced athermal annealing/purification behaviour by in-situ XRD

Author:

Khan Mayur^ORCID,Kedia Sanjay K.^ORCID,Mishra Ambuj^ORCID,Avasthi Devesh Kumar,Tripathi Ambuj

Funder

Council of Scientific and Industrial Research, India

Advanced Instrumentation Research Facility

Department of Science and Technology, Ministry of Science and Technology, India

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference60 articles.

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