300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition-Reference-Cited by-同舟云学术

300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition

Published:2023-07 Issue: Volume:626 Page:157222
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Clerix J.J.^ORCID,Warad L.,Hung J.,Hody H.,Van Roey F.,Lorusso G.^ORCID,Koret R.,Lee W.T.,Shah K.^ORCID,Delabie A.^ORCID

Funder

Fonds Wetenschappelijk Onderzoek

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference41 articles.

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3. M.H. van der Veen, J. Soethoudt, A. Delabie, O.V. Pedreira, V.V. Gonzalez, S. Lariviere, L. Teugels, N. Jourdan, S. Decoster, H. Struyf, C.J. Wilson, K.Croes, Z. Tokei, Ieee, presented at IEEE International Interconnect Technology Conference (IITC), Electr Network, Oct 05-09, 2020.

4. G. N. Parsons, J. Vac. Sci. Technol. A 2019, 37

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