Damage-free X-ray spectroscopy characterization of oxide thin films-Reference-Cited by-同舟云学术

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Damage-free X-ray spectroscopy characterization of oxide thin films

Published:2023-10 Issue: Volume:634 Page:157335
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Lainé Antoine^ORCID,Parmar Rahul,Amati Matteo,Gregoratti Luca,Su Gregory,Xu Ting,Salmeron Miquel

Funder

Basic Energy Sciences

Division of Materials Sciences and Engineering

U.S. Department of Energy

Office of Science

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference32 articles.

1. Titanium dioxide thin films by atomic layer deposition: A review;Niemelä;Semicond. Sci. Technol.,2017

2. Polyethyleneimine for copper absorption: Kinetics, selectivity and efficiency in artificial seawater;Lindén;RSC Adv.,2014

3. High performance thin film electronics based on inorganic nanostructures and composites;Wang;Nano Today,2013

4. Nanolithography in microelectronics: A review;Seisyan;Tech. Phys.,2011

5. In situ photoelectron spectroscopy study of water adsorption on model biomaterial surfaces;Ketteler;J. Phys.: Condens. Matter,2008

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