Influence of the source gas ratio on the hydrogen and deuterium content of a-C:H and a-C:D films: Plasma-enhanced CVD with CH4/H2, CH4/D2, CD4/H2 and CD4/D2-Reference-Cited by-同舟云学术

Influence of the source gas ratio on the hydrogen and deuterium content of a-C:H and a-C:D films: Plasma-enhanced CVD with CH4/H2, CH4/D2, CD4/H2 and CD4/D2

Published:2013-01 Issue: Volume:265 Page:750-757
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Ozeki K.,Sekiba D.,Suzuki T.,Kanda K.,Niibe M.,Hirakuri K.K.,Masuzawa T.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

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