Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering-Reference-Cited by-同舟云学术

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Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering

Published:2004-03 Issue:1-4 Volume:225 Page:29-38
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Chappé J.-M.,Martin N.,Pierson J.F.,Terwagne G.,Lintymer J.,Gavoille J.,Takadoum J.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference30 articles.

1. The physiochemical properties of TiOxNy films with controlled oxygen partial pressure

2. Correlation Between the Electrical Properties and the Morphology of Low-Pressure MOCVD Titanium Oxynitride Thin Films Grown at Various Temperatures

3. Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique

4. Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering

5. Surface sensitivity of SiON integrated optical waveguides (IOWs) examined by IOW-attenuated total reflection spectrometry and IOW-Raman spectroscopy

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