Preferential sputtering effects in depth profiling of multilayers with SIMS, XPS and AES-Reference-Cited by-同舟云学术

Preferential sputtering effects in depth profiling of multilayers with SIMS, XPS and AES

Published:2019-07 Issue: Volume:483 Page:140-155
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Hofmann S.,Zhou G.,Kovac J.,Drev S.,Lian S.Y.^ORCID,Lin B.,Liu Y.,Wang J.Y.^ORCID

Funder

MRI

Slovenian Research Agency

Science and Technology Planning Project of Guangdong Province

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference26 articles.

1. K. Wittmaack, Basic aspects of sputter depth profiling, chap. 3 in: D. Briggs, M. P. Seah, eds., Practical Surf. Analysis Vol. 2-Ion and Neutral Spectroscopy, (Wiley, Chichester, UK 1992), pp. 105–175.

2. S. Hofmann, Auger- and X-ray Photoelectron Spectroscopy in Materials Science, Springer Verlag Heidelberg, New York, Dordrecht, London 2013, Chap. 7: quantitative compositional depth profiling, pp. 297–408.

3. ISO 18115-1:2013(E), Surface chemical analysis – vocabulary – part 1: general terms and terms used in spectroscopy, ISO, Geneva, Switzerland, 2013, Available at https://www.iso.org/obp/ui/#iso:std:iso:18115:-1:ed-2:v1:en:sec:5.

4. Depth resolution in sputter profiling revisited;Hofmann;Surf. Interface Anal.,2016

5. From depth resolution to depth resolution function: refinement of the concept for delta layers, single layers and multilayers;Hofmann;Surf. Interface Anal.,1999

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