Development of tantalum oxynitride thin films produced by PVD: Study of structural stability-Reference-Cited by-同舟云学术

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Development of tantalum oxynitride thin films produced by PVD: Study of structural stability

Published:2013-11 Issue: Volume:285 Page:19-26
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cristea D.,Crisan A.,Barradas N.P.,Alves E.,Moura C.,Vaz F.,Cunha L.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference22 articles.

1. Annealing effects on the structure and mechanical properties of r.f.-sputtered Cr–B hard thin films

2. Annealing effects of In2O3 thin films on electrical properties and application in thin film transistors

3. Effect of annealing temperature on structural, electrical and optical properties of B–N codoped ZnO thin films

4. Structural and surface properties of NiCr thin films prepared by DC magnetron sputtering under variation of annealing conditions

5. Characterization of tantalum oxynitride thin films as high-temperature strain gauges

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stable Oxygen Incorporation in Superconducting TaN: An Experimental and Theoretical Assessment;ACS Omega;2024-08-01

2. Electronic, Optical, and Epsilon Near-Zero Response in Magnetron-Sputtered Tantalum Oxynitride Thin Films;Journal of Electronic Materials;2024-01-07

3. The sputter-based synthesis of tantalum oxynitride nanoparticles with architecture and bandgap controlled by design;Applied Surface Science;2021-09

4. In-situ XRD vs ex-situ vacuum annealing of tantalum oxynitride thin films: Assessments on the structural evolution;Applied Surface Science;2018-04

5. Optical band engineering of metal-oxynitride based on tantalum oxide thin film fabricated via reactive gas-timing RF magnetron sputtering;Surface and Coatings Technology;2016-11

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