Effect of ultraviolet light exposure to boron doped hydrogenated amorphous silicon oxide thin film-Reference-Cited by-同舟云学术

Effect of ultraviolet light exposure to boron doped hydrogenated amorphous silicon oxide thin film

Published:2012-11 Issue: Volume:260 Page:17-22
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Baek Seungsin,Iftiquar S.M.,Jang Juyeon,Lee Sunhwa,Kim Minbum,Jung Junhee,Park Hyeongsik,Park Jinjoo,Kim Youngkuk,Shin Chonghoon,Lee Youn-Jung,Yi Junsin

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference21 articles.

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3. Trap-limited hydrogen diffusion in a-Si:H;Santos;Phys. Rev. B,1992

4. Structure of hydrogenated amorphous silicon from ab initio molecular dynamics;Buda;Phys. Rev. B,1991

5. Hydrogen transport in amorphous silicon;Jackson;Phys. Rev. B,1992

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