Improved near surface characterization of shallow arsenic distribution by SIMS depth profiling-Reference-Cited by-同舟云学术

Improved near surface characterization of shallow arsenic distribution by SIMS depth profiling

Published:2004-06 Issue: Volume:231-232 Page:636-639
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Büyüklimanli Temel H.,Marino John W.,Novak Steven W.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference5 articles.

1. G.R. Mount, et al., in: G. Gillen, R. Lareau, J. Bennett, F. Stevie (Eds.), Proceedings of the SIMS XI, Wiley, Chichester, 1998, p. 317.

2. M.G. Dowsett, et al., in: A. Benninghoven, C. Evans, K. McKeegan, H. Storms, H. Werner (Eds.), Proceedings of the SIMS VII, Wiley, Chichester, 1990, p. 615.

3. Quantitative analysis of nitrogen in oxynitrides on silicon by MCs[sup +] secondary ion mass spectrometry?

4. Surprisingly large apparent profile shifts of As and Sb markers in Si bombarded with ultra-low-energy Cs ion beams

5. http://www.srim.org.

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