Author:
Angermann H.,Henrion W.,Rebien M.,Röseler A.
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference66 articles.
1. T. Hattori, Ultraclean Surface Processing of Silicon Wafers, Springer, Heidelberg, 1998, p. 437.
2. Silanone(Si=O)on Si(100): intermediate for initial silicon oxidation
3. H.-J. Lewerenz, H. Jungblut, Semiconductor micromachining, vol. 1: Fundamental electrochemistry and Physics, in: S.A. Campbell, H.-J. Lewerenz (ed.), John Wiley & Sons, New York, 1998, pp. 217–275.
4. W. Mönch, Semiconductor Surfaces and Interfaces, Springer Series, in: Surf. Sci., vol. 26, Springer-Verlag, Berlin, 1993, pp. 236–240.
5. The Influence of Silicon Surface Cleaning Procedures on Silicon Oxidation
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