Photochemical properties of ultrathin TiO2 films prepared by chemical vapor deposition-Reference-Cited by-同舟云学术

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Photochemical properties of ultrathin TiO2 films prepared by chemical vapor deposition

Published:1989-12 Issue:2 Volume:50 Page:283-290
ISSN:1010-6030
Container-title:Journal of Photochemistry and Photobiology A: Chemistry
language:en
Short-container-title:Journal of Photochemistry and Photobiology A: Chemistry

Author:

Sato Shinri,Sobczynski A.,White J.M.,Bard A.J.,Campion A.,Fox M.A.,Mallouk T.E.,Webber S.E.

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Chemical Engineering,General Chemistry

Reference20 articles.

1. TiO[sub 2] Film Properties as a Function of Processing Temperature

2. Semiconductor Electrodes: I . The Chemical Vapor Deposition and Application of Polycrystalline N‐Type Titanium Dioxide Electrodes to the Photosensitized Electrolysis of Water

3. Semiconductor Electrodes: X . Photoelectrochemical Behavior of Several Polycrystalline Metal Oxide Electrodes in Aqueous Solutions

4. Chemical vapour deposition of TiO2 film using an organometallic process and its photoelectrochemical behaviour

5. Electrical and electrochemical properties of TiO2 films grown by organometallic chemical vapour deposition

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3. Assimilating the photo-induced functions of TiO2-based compounds in textiles: emphasis on the sol-gel process;Textile Research Journal;2014-12-07

4. The effect of aging and precursor concentration on room-temperature synthesis of nanocrystalline anatase TiO2;Materials Letters;2014-02

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