Influence of substrate, precursor, flow field, and hydrogen etching on the flame synthesis of monolayer graphene films-Reference-Cited by-同舟云学术

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Influence of substrate, precursor, flow field, and hydrogen etching on the flame synthesis of monolayer graphene films

Published:2024 Issue:1-4 Volume:40 Page:105594
ISSN:1540-7489
Container-title:Proceedings of the Combustion Institute
language:en
Short-container-title:Proceedings of the Combustion Institute

Author:

Hong Hua^ORCID,Tse Stephen D.^ORCID

Funder

US Army Research Office

Publisher

Elsevier BV

Reference25 articles.

1. The rise of graphene;Geim;Nat. Mater.,2007

2. Scalable production of large quantities of defect-free few-layer graphene by shear exfoliation in liquids;Paton;Nat. Mater.,2014

3. Review of CVD synthesis of graphene;Muñoz;Chem. Vap. Deposit.,2013

4. Flame synthesis of graphene films in open environments;Memon;Carbon N Y,2011

5. Open-atmosphere flame synthesis of monolayer graphene;Hong;Carbon N Y,2021

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