Optoelectronic properties of fluorine-doped silicon nitride thin films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Plasma-Deposited Silicon Nitride Films from SiF2as Silicon Source
2. Electrical properties of silicon nitride films plasma‐deposited from SiF4, N2, and H2 source gases
3. Material properties of plasma‐enhanced chemical vapor deposition fluorinated silicon nitride
4. Physics and applications of optical bistability in semiconductor laser amplifiers
5. Plasma enhanced chemical vapor deposition of fluorinated silicon nitride using SiH4‐NH3‐NF3mixtures
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3. Surface etching, chemical modification and characterization of silicon nitride and silicon oxide—selective functionalization of Si3N4and SiO2;Journal of Physics: Condensed Matter;2016-02-12
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