Characterization of defect removal in hydrogenated and deuterated amorphous silicon thin film transistors-Reference-Cited by-同舟云学术

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Characterization of defect removal in hydrogenated and deuterated amorphous silicon thin film transistors

Published:2006-06 Issue:9-20 Volume:352 Page:1700-1703
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Flewitt A.J.,Lin S.,Milne W.I.,Wehrspohn R.B.,Powell M.J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Defect pool in amorphous-silicon thin-film transistors

2. Thermally stimulated defect removal in hydrogenated amorphous silicon thin film transistors

3. Stability of fully deuterated amorphous silicon thin-film transistors

4. Relative importance of the Si–Si bond and Si–H bond for the stability of amorphous silicon thin film transistors

5. Microscopic mechanisms for creation and removal of metastable dangling bonds in hydrogenated amorphous silicon

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural evolution and mechanical properties of nitrogen doped hydrogenated amorphous silicon thin films;AIP Advances;2020-08-01

2. Structural and optoelectronic properties of a-Si:H: A new analysis based on spectroscopic ellipsometry;Vacuum;2017-12

3. (Invited) Stability under Gate Bias Stressing of Amorphous Oxide Thin Film Transistors;ECS Transactions;2016-08-18

4. Influence of post-hydrogenation upon electrical, optical and structural properties of hydrogen-less sputter-deposited amorphous silicon;Thin Solid Films;2016-01

5. Hydrogenated Amorphous Silicon Thin-Film Transistors (a-Si:H TFTs);Handbook of Visual Display Technology;2016

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