Optical characterization of sputtered amorphous aluminum nitride thin films by spectroscopic ellipsometry
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference27 articles.
1. Influence of growth conditions on electrical characteristics of AlN on SiC
2. Chemical vapor deposition of aluminum and gallium nitride thin films from metalorganic precursors
3. GaN, AlN, and InN: A review
4. Characteristics of hydrogenated aluminum nitride films prepared by radio frequency reactive sputtering and their application to surface acoustic wave devices
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