Intermediate species in a 2.45 GHz microwave plasma sustained in an argon–tetramethylsilane gas mixture
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Instrumentation
Reference14 articles.
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2. Microwave Plasma CVD in the System Si-C-H-Ar: Effect of Process Parameters
3. Epitaxial growth of β-SiC thin films using bis-trimethylsilylmethane on Si(100) with a polycrystalline buffer layer
4. Dépôts par plasma CVD micro-onde à partir de mélanges tétraméthylsilane Argon: Influence des parameters experimentaux
5. The Mass Spectra of Silane and the Methylsilanes
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