Effects of surface relief on the high-dose sputtering of amorphous silicon and graphite by Ar ions
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
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Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Sputter yields of surfaces with nanoscale textures: Analytical results and Monte Carlo simulations;Journal of Applied Physics;2023-02-09
2. Depth of origin of sputtered particles under the oblique incidence of a primary ion beam;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2016-05
3. Relief evolution of HOPG under high-fluence 30keV argon ion irradiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-07
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