Thin film deposition on a corrugated surface: A molecular dynamics approach
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference32 articles.
1. R.W. Hockney, 1970; D. Potter, 1972 (Chapter 5).
2. Experimental study and computer simulation of collimated sputtering of titanium thin films over topographical features
3. Ion-beam-induced epitaxial vapor-phase growth: A molecular-dynamics study
4. Dependence of thin‐film microstructure on deposition rate by means of a computer simulation
5. Molecular dynamics simulations of thin film growth on Ag(100) and (111) with energetic Ag atoms
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