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Effect of hafnium contaminant present in zirconium targets on sputter deposited ZrN thin films

  • Published:2020-01 Issue: Volume:462 Page:90-94
  • ISSN:0168-583X
  • Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
  • language:en
  • Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Fernandez D.A.R.,Brito B.S.S.,Santos I.A.D.,Soares V.F.D.,Terto A.R.,de Oliveira G.B.,Hubler R.,Batista W.W.,Tentardini E.K.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference20 articles.

1. Study of the interaction between a zirconium thin film and an EN C100 steel substrate: temperature effect;Benouareth;Vacuum,2016

2. Handbook of thin film deposition processes and techniques;Seshan;Andrew Publishing,2002

3. Thin films materials technology: Sputtering of compound materials;Wasa,2004

4. electrical and wetting properties of ZrNx films deposited by Ar/N2 vacuum arc discharge: effect of nitrogen partial pressure;Abdallah;Nucl. Instrum. Methods Phys. Res., Sect. B,2013

5. Surface, structural, electrical and mechanical modifications of pulsed laser deposited ZrN thin films by implantation of MeV carbon ions;Mahmood;Nucl. Instrum. Methods Phys. Res., Sect. B,2019
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